发明名称 METHOD AND DEVICE FOR MEASURING THICKNESS OF TRANSPARENT FILM
摘要 PURPOSE:To make it possible to measure the thickness of a thin film in running with high precision by measuring the spectrum of transmitted light obtained by irradiating a transparent film with a parallel white light beam. CONSTITUTION:Through lens 2, light from white light source 1 is made into a parallel light beam and after it is transmitted in transparent film 3, the luminous flux has the width widened via lens systems 4 and 5 and is passed through the prism (or diffraction grating 6) to measure the spectrum through lens 7 and photodetector 8. Since the wavelength of interference light due to film 3 can be found from the maximum or minimum position of the spectrum, the thickness of the film can accurately be calculated. The parallel luminous flux is divided by half-mirror 12 and then separated by the prism (or diffraction grating) 9 into spectral component, and the spectrum of the light source is measured by prism 10 and photodetector 11 to monitor the fluctuations of the light source. Thus, the thickness of a thin film in running can be measured with precision.
申请公布号 JPS56111405(A) 申请公布日期 1981.09.03
申请号 JP19800014083 申请日期 1980.02.06
申请人 UNITIKA LTD 发明人 KASHIMA MASARU;TSUCHIDA AKIRA;TAGAWA TAKASHI
分类号 G01B11/06 主分类号 G01B11/06
代理机构 代理人
主权项
地址