发明名称 Method of detecting a mark by an electron beam and an apparatus therefor
摘要 This invention relates to a method of detecting a mark by an electron beam, the mark being provided on a sample, which includes the steps of scanning the electron beam over an area of the mark in such a manner that the electron beam is subjected to chopping by sampling pulses having a higher frequency than the scanning frequency, eliminating a component of noise from a detected signal representative of the mark, synchronously rectifying the detected mark signal, binary-coding the detected mark signal as compared with a suitable threshold value, and detecting a position of the mark by using the binary-coded signal.
申请公布号 US4286154(A) 申请公布日期 1981.08.25
申请号 US19790097125 申请日期 1979.11.26
申请人 HITACHI, LTD. 发明人 OKUBO, TSUNEO;HAMAMOTO, NOBUO;ICHINO, KAZUO
分类号 H01L21/027;H01J37/304;(IPC1-7):G01N23/00 主分类号 H01L21/027
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