发明名称 Method and apparatus for manufacturing a device by evaporation.
摘要 <p>in a vacuum container an active gas consisting of either one of active hydrogen, active oxygen and active nitrogen with a partial pressure of 1 × 10&lt;Sup&gt;-2&lt;/Sup&gt; Torr or less is produced. In an atmosphere of the active gas, a film, which consists of a compound presenting semiconductor characteristics (CdS, CdSe, ZnSe, ZnS, ZnTe, CdTe) or a solid solution thereof and presents a desired polarity property such as p, n, p&lt;Sup&gt;+&lt;/Sup&gt; or n&lt;Sup&gt;+&lt;/Sup&gt;, is vapor-deposited on a substrate at a desired position with a desired thickness, so as to fabricate an evaporation device which is preferable, for example, as a photoconductive target for a television camera tube.</p>
申请公布号 EP0031918(A2) 申请公布日期 1981.07.15
申请号 EP19800107812 申请日期 1980.12.11
申请人 NIPPON HOSO KYOKAI 发明人 TAKETOSHI, KAZUHISA;OGUSU, CHIHAYA
分类号 H01L21/365;C23C14/00;H01L21/203;H01L21/363;H01L31/00;H01L31/18;(IPC1-7):01L21/363;01L31/18;23C13/08 主分类号 H01L21/365
代理机构 代理人
主权项
地址
您可能感兴趣的专利