发明名称 METHOD OF PREPARING PHOTOELECTRIC CONVERSION ELEMENT
摘要 PURPOSE:To increase a photoresponse velocity by laminating CdS maintaining a phototransmission substrate wherein a transparent conductive film is formed thereon at 200-350 deg.C and treating it in an ambience including O2 at 400-700 deg.C, thereby decreasing a black current piling up CdTe, As2Se3. CONSTITUTION:CdS is vaporized upon a substrate comprizing an In2O3 vaporized on a soda glass keeping said substrate at 200-350 deg.C. When CdS particles become large, a black resistance becomes large. Further, it is very small below 200 deg.C, while it is large over 350 deg.C. Then, it is heated at 400-700 deg.C in the air or an ambience containing O2. At this time, it is heated and cooled by controlling the change of temperature at 2-20 deg.Cmin. After laminating the CdTe and As2Se3 upon CdS having 1-10mum in thickness of approximately 2mum and 0.2mum thereon respectively, an Au-electrode is vaporized. According to this constitution, the photoelectrode conversion element having a small black current and a high velocity photoresponse at the time of reverse current is easily formed.
申请公布号 JPS5679481(A) 申请公布日期 1981.06.30
申请号 JP19790156524 申请日期 1979.12.03
申请人 RICOH KK 发明人 MORI KOUJI;SEGAWA HIDEO;SAKURAI KOUICHI;ITAGAKI MASAKUNI
分类号 H01L27/146;H01L31/0264;H01L31/09;H01L31/18 主分类号 H01L27/146
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