| 摘要 |
PURPOSE:To intend the improvement of the integration together with the simplification of the process and the shortening of the working time by forming a winding portion with the aid of etching to each laminated layer with a selected mask and performing a necessary winding thereto after the formation of multilayers of a conductor and an insulator. CONSTITUTION:After the formation of an insulating film 21 on a substrate 20, a conductive layer 22 and an insulating layer 23 at the first layer are formed in order. Holes for contact forming 23a and 23b are formed. Further, a conductive layer 24, an insulating layer 25 and holes for contact forming 25a and 25b are also formed in the same way. And a conductive layer of the third layer is coated thereon, and further the desirable mask layer 27 having a winding pattern and a pattern for contact forming is formed thereon. Then, the laminated layer under the mask layer 27 is subjected to an etching treatment selectively using said masking layer 27 and a winding portion is formed in each conductive layer. After removing the masking layer 27, a protection film is formed covering the coil portion and then a necessary wiring layer is formed after forming contact holes on the protection film. |
