发明名称 ANALYSIS OF INFINITESIMAL PATTERN
摘要 PURPOSE:To improve the efficiency of microscopically analyzing the position of a specimen in a microscope or the like by projecting the position directly on a record without converting the coordinates of the position with a simple structure utilizing a light. CONSTITUTION:When a specimen base 1 is disposed on a record, the point a of a semiconductor substrate 3 coincides with X, the point (a) is observed by the microscope, and a bulb 2 is disposed at the point a' at this time. When the base 1 is moved to the position as designated by broken line, the point (b) coincides with the X, the point (b) is observed by the microscope, and the bulb is disposed at the point b'. Thus, the points on the substrate 3 are moved by 1:1 out of the base 1. When the bulb 2 is disposed at the point a', the bulb 2 is photographed from above by a photograph 5, and the bulb 2 photographed in multiplex when the bulb 2 is disposed at the point b' without varying the position of the photograph. The picture of the bulb corresponds by 1:1 within the substrate. When the film surface of the photograph 5 is disposed in parallel with the movable surface of the base 1, the points on the substrate 3 may be accurately moved on the film. According to this configuration, an analyzed may indicating improper points by a semiconductor pattern can be efficiently formed readily.
申请公布号 JPS5664435(A) 申请公布日期 1981.06.01
申请号 JP19790140963 申请日期 1979.10.30
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 HIROFUJI HIROICHI
分类号 G01N21/88;G01N21/956;H01L21/027;H01L21/30;H01L21/66;(IPC1-7):01L21/30 主分类号 G01N21/88
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