MASK CHANGER,ESPECIALLY FOR VACUUM DEPOSITION OF TWO-AND MULTILAYER STRUCTURES,申请号PL19780205050-传众专利搜索

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发明名称	MASK CHANGER,ESPECIALLY FOR VACUUM DEPOSITION OF TWO-AND MULTILAYER STRUCTURES
摘要
申请公布号	PL116020(B1)	申请公布日期	1981.05.30
申请号	PL19780205050	申请日期	1978.03.03
申请人		发明人
分类号	B05B;(IPC1-7):C23C13/08	主分类号	B05B
代理机构		代理人
主权项
地址

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