| 摘要 |
PURPOSE:To easily obtain a resist image with a superior pattern on a copper plate by development with an aqueous soln. by forming a photosensitive resin layer soluble in an aqueous Na2CO3 soln. on a flexible film support and a barrier layer soluble in an aqueous NaOH soln. on the resin layer. CONSTITUTION:On a flexible film of polyester or the like with high dimensional stability a photosensitive resin layer is formed using a polymer contg. a radical polymerizable monomer or prepolymer and soluble in a 3% aqueous Na2CO3 soln., and on the layer a barrier layer is formed using a polymer contg. no radical polymerzable monomer or prepolymer and soluble in a 1% aqueous NaOH soln. A protective layer of polyolefin or the like may be formed on the barrier layer. The resulting photoresist constituting body is brought into contact with the copper plate of a printing substrate after removing the protective film so that the barrier layer contacts with the copper surface, and it is exposed from the support film side, freed of the film, and developed. The barrier layer formed prevents a sensitivity lowering of the photosensitive layer due to Cu, giving a fine pattern. |
