发明名称 INDICATION OF DEFECTIVE IN CHIP FORMED WITHIN SEMICONDUCTOR WAFER
摘要 PURPOSE:To indicate defective conditions in chips without damage by discoloring or denaturalizing them with the irradiation of an electromagnetic wave thereon through a protective glass coat on the surface thereof according to the test results after the coat is given a function of responding to electromagnetic waves. CONSTITUTION:A photosensitive glass 6 such as photochromic glass is laminated on a protective oxide film 5. A high energy electromagnetic wave such as X-rays and ultraviolet rays is irradiated on a defective chip to discolor the part (a). Otherwise, it is possible that an ion is projected into an SiO2 glass to discolor the surface thereof and then a low level of a laser beam is irradiated thereon to heat until it is returned to the original color. This eliminates mechanical control and damage to chip themselves permitting the analyzing of defectives later without trouble.
申请公布号 JPS5654048(A) 申请公布日期 1981.05.13
申请号 JP19790130649 申请日期 1979.10.08
申请人 MITSUBISHI ELECTRIC CORP 发明人 TANAKA TOMIHITO
分类号 H01L21/66;(IPC1-7):01L21/66 主分类号 H01L21/66
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