发明名称 SEMICONDUCTOR MEMORY
摘要 PURPOSE:To prevent erroneous storage caused by alpha particles irradiated from a radioactive atom of infinitesimal amount contained in a package by forming a metallic film made of elements of 72-79 of atomic numbers on the surface of a semiconductor substrate formed with memory cells. CONSTITUTION:There are formed a number of memory cells 31, a peripheral circuit 32 for operating the memory cells 31, an insulating film 33 formed on the entire surface except the connecting portions of the respective elements, and a wiring metal 34 for electrically connecting between the respective elements on the main surface of a semiconductor substrate 30, and a protective film 35 made of silicon oxide, silicon nitride or the like on the surface to cover completely the circuit 32. Further, a metallic film 36 made of gold is so formed on the surface 35 as not to make contact with the metal 34 exposed by a photoetching process of the like. The film 36 may be formed of elements of 72-79 of atomic numbers having large preventive capacity of alpha particles 37 in addition to the gold.
申请公布号 JPS5650554(A) 申请公布日期 1981.05.07
申请号 JP19790127631 申请日期 1979.10.02
申请人 MITSUBISHI ELECTRIC CORP 发明人 ENOMOTO TATSUYA;NAGASAWA KOUICHI
分类号 H01L27/10;H01L21/8242;H01L23/556;H01L27/108;H01L29/40;H01L29/78 主分类号 H01L27/10
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