| 摘要 |
PURPOSE:To perform high accuracy washing by spraying clean pure water to washed substances from the wall side of a room wherein the pure water is drained by leaving the water intact. CONSTITUTION:A room 12 is provided by surrounding the cavity 9 of a cubicle 8 with perforated plates 10, 11 to accommodate washed substances M. Pure water is sent from an entrance 14 by compression and the water is repleted between the perforated plates 10, 11 and the cubicle 8 to effuse from holes 13 and the washed substances are washed. After washing, the pure water is drained through the holes of a bottom board 15. In this way, washed substances, especially a mask for manufacturing a semiconductor device will be washed with high accuracy. |
