| 摘要 |
PURPOSE:To improve the manufacturing workability of masks by forming the reticles for manufacturing the pattern printing masks used at the manufacture of semiconductor integrated circuits by forming plural kinds of chip patterns on one reticle. CONSTITUTION:A reticle for manufacturing the printing masks used at the manufacture of semiconductor integrated circuits is constituted by a assuring plural pattern regions 3, 4, 5, 6, etc. on one sheet of a glass plate 1, and forming respectively plural kinds of patterns in these pattern regions. For example, 3 forms a pattern for device chips, and 4 a pattern for monitor chips. 5, 6 form patterns for wafer aligners. Hence, at the time of manufacturing master masks, reticle exchanging works are decreased to a fraction of those by conventional 1 chip pattern/1 reticle type, and the steps of reticle cleaning at the setting of reticles are considerably reduced. |
