发明名称 MANUFACTURE OF SOLID THIN FILM BY ION BEAM
摘要 PURPOSE:To obtain easily a solid thin film having a perfect composition and structure by a method wherein positive ions and negative ions are alternately radiated repetitively to the surface of a substrate being electrically insulated from the circumference putting radiation stop times between them, and ions are made to adhere intermittently to the surface of the substrate to form a solid film. CONSTITUTION:An ion generator 1a and a substrate 2 being fitted up to a substrate holder 3 are made to confront putting a gap between them, and the path of ions locating betwen them is surrounded with ion collecting plates 4 connected to a switch 5. Constituting a device in this way, ionized particles of element A being charged in positive and are generated from the generator 1a are made to be arranged being distributed on the surface of the substrate 2 insulated electrically from the circumference, and when the saturation condition is attained and the growth of ion film is stopped, the collecting plates are earthed or are made to be a reverse potential to eliminate remained ions in the middle space. Then ionized particles of element B being charged in negative and are generated from a generator 1b being put side by side at the neighborhood of the generator 1a are radiated, and are put upon the previously formed ion film.
申请公布号 JPS5624924(A) 申请公布日期 1981.03.10
申请号 JP19790100187 申请日期 1979.08.08
申请人 发明人
分类号 C30B23/08;H01L21/203;H01L21/268 主分类号 C30B23/08
代理机构 代理人
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