| 摘要 |
A process for forming a high resolution recording medium including at least a high resolution, patterned interference filter formed from at least two reflecting layers separated by an interference layer including the step of removing patterned portions of a reflective layer not protected by a photosensitive layer by means of chemical etching or ion beam etching. When chemical etching is used, the etching process is accelerated to reduce under-etching by maintaining a rapid, thorough, and continuous boundary surface exchange of the etching solution at the boundary between the etching solution and the reflective layer being etched. |
