摘要 |
An original pattern plate obtained by the use of a photo-sensitive resin composition comprising: (A) an unsaturated polyester having an acid value of from 10 to 40 and having not less than 50% by mole of unsaturated acids in the acid component, (B) a photo-polymerizable, ethylenically unsaturated compound which essentially contains a compound having a photo-polymerizable, ethylenically unsaturated linkage and at least one hydroxyl group, (C) a melamine compound of the formula: (C3H6-(m+n)N6)(CH2OH)m(CH2OR)n wherein R is an alkyl group having 1 to 4 carbon atoms, m is from 0 to 6, n is from 0 to 6 and m+n is from 1.5 to 6, or its condensate having an average condensation degree of not more than 4, (D) a photo-polymerization initiator, and (E) a thermal polymerization inhibitor, the weight proportion of the components (A), (B) and (C) satisfying the relationships of the following equations: 1/5</=B/(A+B)</=3/5 and 1/50</=C/(A+B+C)</=1/5, which is improved in mechanical strength, particularly in resistance to heat and pressure.
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