发明名称 |
Positive-acting photoresist composition |
摘要 |
A positive-acting light-sensitive composition having excellent utility as a photoresist, comprising: (a) a crosslinked urethane resin formed by a catalyzed crosslinking of a non-heat reactive novalac phenolic resin and a polyisocyanate compound; (b) an epoxy resin having an epoxide equivalent weight of less than about 400 and a curing agent therefor; and (c) a positive-acting photosensitizer. Upon applying to a substrate and drying, the epoxy resin cures, resulting in a film useful as a photoresist or in the formation of lithographic printing plates.
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申请公布号 |
US4247616(A) |
申请公布日期 |
1981.01.27 |
申请号 |
US19790060601 |
申请日期 |
1979.07.27 |
申请人 |
MINNESOTA MINING AND MANUFACTURING COMPANY |
发明人 |
VIKESLAND, JOHN P.;PRESLEY, RICHARD M. |
分类号 |
G03F7/021;G03F7/023;(IPC1-7):G03C1/68;G03C1/52 |
主分类号 |
G03F7/021 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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