| 摘要 |
PURPOSE:To enable contact exposure transcription needing positioning at high accuracy in excellent reproducibility for a short time by a method wherein a mask and a wafer are pushed by means of springs among a wafer holder and wafer stages and both are stuck. CONSTITUTION:A mask 6 is attracted to a mask stage 7 and a wafer 8 to a wafer holder 9 by vacuum respectively, and the mask 6 and the wafer 8 are brought to an access condition. The mask 6 and the wafer 8 are stacked so as to take a fixed position relationship by moving a stage 7 or 10 under this condition. After positioning is completed, the mask 6 and the wafer 8 are butted by letting the stage 7 fall or lifting the stage 10. In this case, springs 11 between the holder 9 and the stage 10 are bent, and the mask 6 and the wafer 8 are pushed without being damaged by force corresponding to the reflection of the springs 11. And the attraction of the wafer 8 to the holder 9 by vacuum is released, space surrounded by sealing rubber 12 for sticking around the wafer 8 is evacuated, and the mask 6 and the wafer 8 are stuck. |
