发明名称 Gas laser systems
摘要 A gas laser system which provides sequence lines of emission in addition to the regular lines. The system includes a discharge cavity having a discharge tube and a hot gas absorber cell. The lasing gas and the gas in absorber are identical and may be either CO2, N2O or isotopes of this gas. The absorber cell is approximately 1/5 to 1/3 the length of the discharge cavity with the interior temperature of the absorber cell being greater than 200 DEG C. and the pressure within the cell being in the order of 20 torr.
申请公布号 US4242645(A) 申请公布日期 1980.12.30
申请号 US19770780062 申请日期 1977.03.22
申请人 CANADIAN PATENTS & DEVELOPMENT LTD 发明人 REID, JOHN;SIEMSEN, KLAUS J
分类号 H01S3/098;H01S3/223;(IPC1-7):H01S3/22 主分类号 H01S3/098
代理机构 代理人
主权项
地址