| 摘要 |
PURPOSE:To produce the optical parts having ruggedness in biaxial directions by one time of exposing. CONSTITUTION:The transmittance modulation type photomask 3 having patterns alternately arranging first and second rows Ra1, Rb1 and Ra2, Rb2 at prescribed intervals a, b along respective first and second directions A, B is constituted. The first row Ra1, Rb1 alternately have light shielding parts 3B and half opening parts 3C and the second rows Ra2, Rb2 alternately have opening parts 3A and half-opening parts 3C. The ruggedness arranged at the prescribed intervals a, b along the first and second directions A, B is formed by once exposing the photosensitive material film on a base material surface by using such photomask 3. |
