| 摘要 |
PURPOSE:To improve the accuracy of pattern position alignment by removing the heat rays contained in radiation light and the heat occuring in said heat rays. CONSTITUTION:A heat pipe 8a is disposed in close contact with the back of a cold mirror 5 and the heat by heat rays such as infrared rays and far infrared rays is absorbed and removed by refrigerant such as water. Since this enables the removal of the heat of the luminous flux from a light source 1 such as high-voltage mercury arc lamp past condensing mirror 2, reflecting mirror 3 and field lens 4, reflected by the cold mirror 5 and transmitting through a photomask 7 by a radiation lens 6, the temperature rise of the photomask 7 and substrate at the exposure operation is eliminated and the accuracy of pattern position alignment is improved. |
