发明名称 |
Two layer resist system |
摘要 |
A resist mark comprising two layers of resist, one of which is saturated with a diluant which does not dissolve the other. In one embodiment, the two layers of resist are applied upon a substrate, the first layer of which is more soluble in a developer. The second layer is said saturated resist and the first layer is non-saturated. This composite is preferably used to form a relief mask with recessed sidewalls used in lift-off processes.
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申请公布号 |
US4238559(A) |
申请公布日期 |
1980.12.09 |
申请号 |
US19780936435 |
申请日期 |
1978.08.24 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORP |
发明人 |
FENG, BAI-CWO;FENG, GEORGE C |
分类号 |
G03F7/095;H01L21/312;H05K3/14;(IPC1-7):G02C5/18 |
主分类号 |
G03F7/095 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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