发明名称 PHOTOSENSITIVE IMAGE FORMING MATERIAL
摘要 PURPOSE:To enhance the etchability and peelability of a photosensitive image forming material by covering a support with a layer of a mixture of N-alkoxyalkylated alcohol-soluble polyamide and alcohol-soluble polyamide which is not N-alkoxyalkylated and forming a photosensitive layer on the org. covering layer. CONSTITUTION:A support is covered with an org. covering layer consisting of 100-40wt% N-alkoxyalkylated polyamide obtd. by N-alkoxyalkylating polyamide with lower aliphatic alcohol or aldehyde and of 0-60wt% alcohol-soluble polyamide which is not N-alkoxyalkylated. On the layer a photosensitive composition layer consisting of an azide compound, an o-quinone diazide compound and an org. solvent-soluble diazo compound is formed. The org. layer disclosed by exposing and developing this photosensitive material has superior etchability and peelability, and an image forming material suitable for a process master for a photomechanical process is obtd.
申请公布号 JPS55155349(A) 申请公布日期 1980.12.03
申请号 JP19790062935 申请日期 1979.05.21
申请人 DAICEL LTD 发明人 KUBO KEIJI;ISHIHARA TETSUO
分类号 G03F7/09;G03C1/52;G03C1/72;G03F1/00;G03F7/105;G03F7/11 主分类号 G03F7/09
代理机构 代理人
主权项
地址