发明名称 |
PHOTOSENSITIVE IMAGE FORMING MATERIAL |
摘要 |
PURPOSE:To enhance the etchability and peelability of a photosensitive image forming material by covering a support with a layer of a mixture of N-alkoxyalkylated alcohol-soluble polyamide and alcohol-soluble polyamide which is not N-alkoxyalkylated and forming a photosensitive layer on the org. covering layer. CONSTITUTION:A support is covered with an org. covering layer consisting of 100-40wt% N-alkoxyalkylated polyamide obtd. by N-alkoxyalkylating polyamide with lower aliphatic alcohol or aldehyde and of 0-60wt% alcohol-soluble polyamide which is not N-alkoxyalkylated. On the layer a photosensitive composition layer consisting of an azide compound, an o-quinone diazide compound and an org. solvent-soluble diazo compound is formed. The org. layer disclosed by exposing and developing this photosensitive material has superior etchability and peelability, and an image forming material suitable for a process master for a photomechanical process is obtd. |
申请公布号 |
JPS55155349(A) |
申请公布日期 |
1980.12.03 |
申请号 |
JP19790062935 |
申请日期 |
1979.05.21 |
申请人 |
DAICEL LTD |
发明人 |
KUBO KEIJI;ISHIHARA TETSUO |
分类号 |
G03F7/09;G03C1/52;G03C1/72;G03F1/00;G03F7/105;G03F7/11 |
主分类号 |
G03F7/09 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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