发明名称 |
SOLUTION FOR ACTIVATION OF DIELECTRIC SURFACE AND OBTAINING CONDUCTING LAYER THEREON |
摘要 |
A solution for activation of a dielectric surface and obtaining a conducting layer thereon, containing, in g/l: copper salt 35-350, hypophosphorous acid salt 35-400, stabilizer 0.004-250. A method of preparation of dielectric surfaces before electrochemical metallization comprising their activation and creation of a conducting layer thereon by way of their treatment with a solution of the above composition and subsequent thermal treatment at a temperature of 30-350`C. |
申请公布号 |
WO8002570(A1) |
申请公布日期 |
1980.11.27 |
申请号 |
WO1980SU00063 |
申请日期 |
1980.04.25 |
申请人 |
INSTI FIZI KHIMI OSNOV PERERABOTKI MINER SYRYA;LOMOVSKY O;BOLDYREV V;MIKHAILOV Y;MAKKAEV A |
发明人 |
LOMOVSKY O;BOLDYREV V;MIKHAILOV Y;MAKKAEV A |
分类号 |
H05K3/10;C23C18/16;C23C18/40;C23C28/02;C25D5/54;C25D5/56;H01G4/008;H05K3/18;H05K3/42;(IPC1-7):23C3/02;25D5/54 |
主分类号 |
H05K3/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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