PLASMA ETCHING METHOD AND ITS APPARATUS,申请号JP19790057121-传众专利搜索

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发明名称	PLASMA ETCHING METHOD AND ITS APPARATUS
摘要
申请公布号	JPS55150919(A)	申请公布日期	1980.11.25
申请号	JP19790057121	申请日期	1979.05.11
申请人	HITACHI LTD	发明人	YAMAGUCHI HISAO;KAMEYAMA KATSUNORI
分类号	H01L21/302;H01L21/3065	主分类号	H01L21/302
代理机构		代理人
主权项
地址

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