发明名称 Process for producing material sensitive to electromagnetic and corpuscular radiation
摘要 A process of producing a material sensitive to an electromagnetic and corpuscular radiation involves successively depositing, onto a transparent substrate, a layer of a semiconductor, a barrier layer inert to the semiconductor layer and a layer of a metal capable of reacting with the semiconductor layer under the effect of the electromagnetic and corpuscular radiation with the formation of the reaction products. After deposition of the metal layer, there is performed annealing at a temperature equal to or exceeding the temperature of diffusion of the material of the barrier layer into the material of the layers adjacent thereto. The annealing is conducted for a period sufficient for a partial or a complete dissolution of the barrier layer.
申请公布号 US4234625(A) 申请公布日期 1980.11.18
申请号 US19780870835 申请日期 1978.01.19
申请人 PETROV, VYACHESLAV V.;KRJUCHIN, ANDREI A. 发明人 PETROV, VYACHESLAV V.;KRJUCHIN, ANDREI A.
分类号 G03C1/705;(IPC1-7):G03C5/00 主分类号 G03C1/705
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