| 摘要 |
PURPOSE:To process hygienically safely a photosensitive image forming material having a photoresist layer on an N-alkoxyalkylated polyamide layer by using an aqueous solution of a neutral salt of specified disubstituted benzene or naphthalene to etch the material. CONSTITUTION:An aqueous solution containing 10-40wt% of one or more kinds of aromatic neutral salts of X- and Y-substituted beazene or naphthalene is used as an etching solution. In the salt X is SO3Na or COONa, and Y is H, CH3, NH2 or OH. An N-alkoxyalkylated polyamide-base material for an alcohol-soluble polyamide layer is excellent in film formability and peelability, and sodium salicylate or the like out of the above-mentioned salts esp. has the great effect of etching the polyamide layer. A photoresist layer on the polyamide layer is exposed and developed, and then the disclosed polyamide is etched with the solution to obtain a superior image for a graphic design, etc. During the operation hygienic trouble due to alcohol evaporation is avoided. |
