| 摘要 |
PURPOSE:To obtain a vacuum apparatus having high reliability by a constitution wherein there are provided vacuum vessels containing substrates to be treated, a supporting mechanism for the substrates to be treated, a mechanism for moving the supporting mechanism and vacuum valves being unitary with the supporting mechanism. CONSTITUTION:Vacuum vessels 11, 21, 31 are evacuated to a predetermined level of pressure by means of a vacuum pump. A door 22 is opened, a substrate 411 is placed, and the door 22 is shut. Then the vacuum vessel 11 is evacuated. A substrate-supporting mechanism 40 is moved in the direction of an arrow 26. Treatments such as vacuum metallizing, sputering are carried out within the vacuum vessel 11. In a vacuum vessel 31, a door 32 is opened and a substrate 413 is exchanged for untreated substrate. In this case, each vacuum vessel is kept tightly in the vacuum state by each vacuum valve provided in combination with the substrate- supporting mechanism. Each vacuum valve is constructed by a simple structure by fixing valve seats 44, 48, 51 and O-rings 45, 49, 52 to the substrate-supporting mechanism. |
