LPCVD SYSTEMS HAVING IN SITU PLASMA CLEANING

摘要

Process for cleaning wall deposits from a furnace tube (11) used in a low pressure chemical vapor film deposition system (10). The cleaning of the tube is carried out in situ in the furnace by creating a deposit etching plasma within the tube. The plasma is generated by introducing a suitable gas into the tube and applying RF energy to elements (32) located along selected portions of the tube for coupling the RF energy to the gas.