发明名称 TARGET FOR SPUTTERING
摘要 PURPOSE:To avoid the exchange of target due to thermal breakage by fixing a ceramic, glass, or resin plate target, excluding metal one, to cathode with the aid of a mechanical pressing force applied to its peripheral side from the circumference. CONSTITUTION:The target 17 is fixed to the cathode body 11 of a sputtering apparatus provided with the cooling water pipes 14, 15 and the high-frequency power applicating terminal 16 with the aid of the flange 19 on the inner wall side of the O-ring 18 fastened by the bolt 20, and then the outside of the target 17 is further fixed by the bolt 21. The sputtering target 17 fixed in this way is free of breakage even if the target is made of ceramic, glass, resin, etc., which are apt to break thermally in most cases, excluding metals.
申请公布号 JPS5589471(A) 申请公布日期 1980.07.07
申请号 JP19780164724 申请日期 1978.12.26
申请人 MURATA MANUFACTURING CO 发明人 NISHIYAMA KOUJI
分类号 C23C14/34 主分类号 C23C14/34
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