| 摘要 |
PURPOSE:To record the production history of a semiconductor device in the device, by forming a photo mask with a pattern so that the data of mask production (circuit design) may be printed in the semiconductor device. CONSTITUTION:The date of production of photo mask and the date of design of semiconductor integrated circuit are formed on a photo mask at the position being printed in the semiconductor device. That is, the digitized pattern generate (original) after complete circuit design is collated against the pattern, and when the master mask is fabricated with a photo repeater from a reticle (a semiconductor device printed on a photo mask), the production (design) date reticle is superposed and printed over. |
