| 摘要 |
<p>A photo-temphate contains an additional doped photoresist layer (A), on the metal- or metal oxide layer topology applied to a transparent substrate. Pref. doping ions are B, P or Sb. The templates are used in (i) semiconductor industry, in prodn. of semiconductor components, esp. of integrated circuits and high frequency appts., (ii) holography, in the prodn. of optical instruments, precision parts for watch industry and in printed circuitry. The additional layer (A) increased template service-life 4-6 x, e.g. to 600 copies. "Breakdown"-caused defects are reduced from 5-7% to 1-2%. Reflection capacity is reduced from 50-60%, on using a Cr layer, to 5-7%. Optical density is increased to 2.2-3 units, whereby exposure time can be reduced. Static surface-charging is prevented.</p> |
