| 摘要 |
PURPOSE:To reduce the number of processes or steps and labor, by making, inspecting and correcting a pattern in one process by a single unit for manufacturing a photomask. CONSTITUTION:Electronic lenses 6-8 are driven by a lens power supply unit 9, which is controlled by a scanning controller 10. A prescribed pattern is made on a mask 15 in accordance with information supplied from a pattern memory 13 through a central controller 12. The mask 15 provided with the pattern is scanned by an electron beam of energy smaller than that for making the pattern so that a secondary electron image of the pattern is obtained by a detector 11. A pattern signal from the detector 11 is compared with that from the memory 13 by the controller 12. A detective pattern portion, which does not coincide with the pattern stored in the memory 13, is stored into a defect storage region 20 of the memory. After inspection, a defective part due to the shortage of electron irradiation is patterned again in the same way as the initial patterning, thereby correcting the mask pattern. |
