发明名称 METHOD OF DRAWING BY ELECTRON BEAM
摘要 PURPOSE:To obtain an excellent picture drawing while improving the dimensional precision of the picture; reducing its edge roughness; and shortening the radius of curvature of a corner portion by providing the dimension of an electron beam in such a manner that it is measured at a ratio of approx. 1:2 in a direction perpendicular to its scanning line. CONSTITUTION:An electron beam emitted from an electron gun 1 is led to pass through the anode 2 and converged 5 by a capacitor lens 4, then controlled by a blanking deflecting plate 6. The output beam is reconverged by a capacitor lens 8 and electrostatically deflected 9, before being scaled down and projected on a sample material 11 through an object lens 10. In this case, by providing the dimension of the electron beam in such a way that it is measured at a ratio of approx. 1:2 in a direction perpendicular to its scanning line, it becomes possible to increase the dimensional precision of the picture; reduce its edge roughness; and shorten the radius of the curvature of its corner portion, thus obtain an excellent picture drawing.
申请公布号 JPS5548929(A) 申请公布日期 1980.04.08
申请号 JP19780120803 申请日期 1978.09.30
申请人 TOKYO SHIBAURA ELECTRIC CO 发明人 TAKIGAWA TADAHIRO
分类号 H01J37/305;H01J37/317;H01L21/027 主分类号 H01J37/305
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