| 摘要 |
PURPOSE:To provide a chemical polishing fluid which makes it possible to polish selectively burrs alone easily at a low cost, while restraining failure of a parts body when the parts made of Al or Al alloy to be polished have burrs, by using a fluid contg. an inorg. acid and an aromatic Al chelating agent as a chemical polishing fluid. CONSTITUTION:A polishing fluid is prepared which contains an inorg. acid such as phosphoric acid 50-90%, pref. 65-85% in concn., and an aromatic Al chelating agent, e.g., sodium catecholdisulfonate 0.05-15%, pref., 0.2-10% in concn. To the polishing fluid are further added at least 0.01%, pref., 0.1-5% a nonionic surface active agent, not more than 5% H2O2, about 5-20g Al<3+> as AlPO4. 31/2H2O per liter polishing fluid, and 1-20g Cu<2+> as CuSO4.5H2O per litter polishing fluid. Polishing treatment by use of this fluid produces excellent surface conditions after polishing, exerting no bad influence on the later steps even when anodizing treatment is conducted. |
