发明名称 DESENSITIZING SOLUTION FOR LITHOGRAPHIC PRINTING
摘要 PURPOSE:To prevent the printing dirt by adding a radical polymerizational inhibitor in desensitizing solution and then effecting post treatment (post exposure and post heat) after the plate making of lithography. CONSTITUTION:A) 0.1-20wt% of hydrophilic coloid substance like cellulose derivative and alginate, preferrably 0.4-15wt%, B) 0.001-20% of radical polymerization inhibitor like hydroquinone, diphenylamine, dinitrobenzene, etc., preferrably 0.5-5%, C) desensitizing solution consisting in 40-90% of water.
申请公布号 JPS5542890(A) 申请公布日期 1980.03.26
申请号 JP19780117728 申请日期 1978.09.22
申请人 FUJI PHOTO FILM CO LTD 发明人 TACHIKAWA HIROMICHI;TAKAHASHI YOUNOSUKE;ISHII KAZUO;IKEDA TOMOAKI;SHINOZAKI FUMIAKI
分类号 B41N3/08;G03F7/40 主分类号 B41N3/08
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