发明名称 METHOD OF MAKING THICK FILM FINE PATTERNS
摘要 <p>A method of making thick film fine patterns comprising the steps of: applying paste for forming circuits on an insulated substrate (3), drying the paste, depositing photoresist material (3) on the surface of the paste film (2), the paste being oily whereas the photoresist is aqueous or vice versa, thereby enabling to form circuit patterns by means of photo-etching technique. </p>
申请公布号 WO1980000520(P1) 申请公布日期 1980.03.20
申请号 JP1979000228 申请日期 1979.08.28
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