发明名称 IMPACTTRESISTANT RESIN COMPOSITION
摘要 PURPOSE:The title composition for contour extrusion, cpapble of giving molded articles having improved impact strength, heat stability, and processability, prepared by incorporating a hindered phenol antioxidant, an ethylenediamine tetracetate, and an MBS resin-containing vinyl chloride resin. CONSTITUTION:(A) 50-99 parts by wt. of a vinyl chloride resin is kneaded with (B) 1-50 parts by wt. of an MBS resin with an acid content <=1,000 ppm due to the emulsifier, prepared by grafting 25-75 parts by wt. of a monomer mixture of 30-70wt% of methyl methacrylate and 30-70wt% of styrene onto 25-75 parts by wt. of a copolymer rubber consisting mainly of 50wt% or more of polybutadiene and butadiene and styrene, (C) 0.01-2 parts by wt. of a hindered phenol antioxidant, consisting of C, H, O and/or C, H, O, and S, and (D) 0.1-1 part by wt. of an ethylenediaminetetraacetate.
申请公布号 JPS5536225(A) 申请公布日期 1980.03.13
申请号 JP19780108941 申请日期 1978.09.05
申请人 MITSUBISHI RAYON CO 发明人 KISHIDA KAZUO;OOSAKA YOSHIHISA;KANEDA MASAHIRO
分类号 C08L27/00;C08K5/13;C08K5/16;C08K5/17;C08L1/00;C08L7/00;C08L21/00;C08L27/06;C08L33/00;C08L33/02;C08L51/00;C08L51/02;C08L51/04 主分类号 C08L27/00
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