发明名称 EPITAXIAL WAFER FOR MONOLITHIC LUMINOUS DIODE MATRIX
摘要 PURPOSE:To prevent luminous diodes from exothermic deterioration by making an epitaxial layer from a chrome-containg semiisolation layer, an n-type GaAsP mixed crystal epitaxial layer, a p-type inter-row isolation layer. CONSTITUTION:On the surface of a single crystal substrate is formed a GaAsP crystal mixing ratio variable layer 2. When the crystal mixing ratio reaches a requred value a semiisolation layer 3 is formed by adding some chrome with a low diffusion velocity, on this layer is formed an n-type GaAsP actuating layer containing impurities such as Te, S, etc. and a p-type isolation layer which separetes rows from each other is made by selectively diffusing p-type imputies. In this way chrome does not diffuse into the n-type GaAsP crystal-mixing-ratio-constant layer 5 by heat treatment, enough thickness is given and luminous diodes can be prevented from exothermic deterioration.
申请公布号 JPS5534465(A) 申请公布日期 1980.03.11
申请号 JP19780107318 申请日期 1978.09.01
申请人 MITSUBISHI MONSANTO CHEM 发明人 MAEDA KATSUNOBU
分类号 H01L21/205;H01L33/14;H01L33/16;H01L33/30;H01L33/34 主分类号 H01L21/205
代理机构 代理人
主权项
地址