| 摘要 |
An apparatus for transporting a workpiece at high temperature is provided with enclosure means substantially surrounding a workpiece supported, or gripped by, the apparatus. The enclosure includes an interior surface positioned to be exposed to the workpiece and formed from a material that is highly reflective of infrared radiation. Separate segments of the enclosure are movable relative to each other (e.g., hingedly connected to each other) to permit entry and removal of a workpiece. Provision is also made for introducing an inert atmosphere into the enclosure.
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