发明名称 FILM THICKNESS MEASURING APPARATUS
摘要 PURPOSE:To attain to enhance accuracy by measuring the film thickness of a desired element by determining the indivisual intensity of superposed X-rays, by synthesizing the indivisual intensity of superposed X-rays obtained from multi- layered elements from the preliminarily measured spectrum of X-rays obtained from a reference specimen. CONSTITUTION:A measuring specimen 2 is irradiated with X-rays 3a generated from an X-ray tube bulb 1 and elements contained in the measuring specimen 2 are excited to respectively generate characteristic X-rays 3b. These characteristic X-rays are incident on a radiation detector 3 to be converted to an electric signal 3c and an X-ray energy spectrum 5 is displayed on CRT on the basis of the signal 3c by a peak analyser 4. For example, when the thickness of nickel plating on a copper plate is measured, energy spectra 4a, 4b of a 100% copper specimen and a 100% nickel specimen are obtained and the differentiation spectra 5c of the nickel specimen plated on a copper plate is expressed as a linear function from differentiation spectra 5a, 5b of said energy spectra and the X-ray relative intensity beta of copper and nickel is calculated.
申请公布号 JPS60135811(A) 申请公布日期 1985.07.19
申请号 JP19830247918 申请日期 1983.12.26
申请人 SEIKO DENSHI KOGYO KK 发明人 ICHINOMIYA YUTAKA
分类号 G01N23/223;G01B15/02 主分类号 G01N23/223
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