发明名称 Method and apparatus for producing diamond thin films
摘要 The present invention concerns a method of producing a diamond thin film. A plasma-activated gas, obtained by exciting a starting material containing a carbon source gas, is brought into contact with a surface of a substrate, on which a diamond thin film is to be formed under the presence of an auxiliary member placed adjacent to a protruded portion present at the surface of the substrate. The diamond thin film is thereby formed on the substrate. An apparatus for producing a diamond thin film by means of a microwave plasma method has an auxiliary member placed adjacent to a protruded portion present at the surface of the substrate on which the diamond thin film is to be formed.
申请公布号 US5258206(A) 申请公布日期 1993.11.02
申请号 US19910813041 申请日期 1991.12.23
申请人 IDEMITSU PETROCHEMICAL CO., LTD. 发明人 HAYASHI, NARIYUKI;ITO, TOSHIMICHI
分类号 C23C16/27;C23C16/458;C30B25/12;(IPC1-7):B05D3/06;B01J3/06 主分类号 C23C16/27
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