发明名称 Process of manufacturing an electrical bonding interconnect having a metal bond pad portion and having a conductive epoxy portion comprising an oxide reducing agent
摘要 A process for manufacturing a low contact resistance electrical bonding interconnect having a metal bond pad portion and conductive epoxy portion. The conductive epoxy portion comprises a metal oxide reducing agent for reducing oxides formed during the fabrication of the bonding interconnect.
申请公布号 US5480834(A) 申请公布日期 1996.01.02
申请号 US19930166747 申请日期 1993.12.13
申请人 MICRON COMMUNICATIONS, INC. 发明人 LAKE, RICKIE C.;TUTTLE, MARK E.
分类号 H01L21/60;H01L23/485;H05K3/32;(IPC1-7):H01L21/288 主分类号 H01L21/60
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