| 摘要 |
Stripping solutions, free from phenol and chlorinated hydrocarbon compounds, comprising a surfactant alkylarylsulfonic acid having 12-20 carbons, a hydrotropic aromatic sulfonic acid having 6-9 carbons and optionally a halogen-free aromatic hydrocarbon solvent with a boiling point above 150 DEG C. The solution can also contain a halogen-free aliphatic hydrocarbon solvent. The stripping compositions effectively remove organic polymeric substances e.g. photoresists, paints, varnishes, and fluxes, from inorganic substrates and are substantially clear water rinsable. |
