发明名称 PLASMA CHEMOTRONIC METHOD OF OBTAINING OXYGEN-CONTAINING VAPOUR-GAS MIXTURE
摘要 FIELD: chemistry. ^ SUBSTANCE: invention relates to physico-chemical technologies and technology of water solutions. Plasma chemotronic method of obtaining oxygen-containing vapour-gas mixture includes passing asymmetric in density rectified electric current between perforated anode located in lower base of inter-electrode continuous chamber and rod cathode located in upper base of inter-electrode continuous chamber with simultaneous forcing of saturated with oxygen, acidified or alkalified de-ionized water through perforated anode into inter-electrode chamber. Method is carried out in stable volumetric ball chemotronic plasma, spontaneously arising between anode and cathode in electrified gas-liquid flow of de-ionized water with concentration of ions H3O+ or OH-, which does not exceed 0.2 M, with operation voltage in electro-chemical circuit of plasmochemotrone from 400±5 to 280±3 Volts. ^ EFFECT: increase of vapour-gas mixture output, reduction of energy consumption. ^ 6 dwg, 3 tbl
申请公布号 RU2343227(C2) 申请公布日期 2009.01.10
申请号 RU20050133099 申请日期 2005.10.27
申请人 ZYKOV EVGENIJ DMITRIEVICH;ZYKOVA TAMARA NIKOLAEVNA 发明人 ZYKOV EVGENIJ DMITRIEVICH;ZYKOVA TAMARA NIKOLAEVNA
分类号 C25B1/30;C02F1/46;C25B1/04 主分类号 C25B1/30
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