发明名称 Dielectric structures in solar cells
摘要 A dielectric, structure and a method of forming a dielectric structure for a rear surface of a silicon solar cell are provided. The method comprises forming a first dielectric layer over the rear surface of the silicon solar cell, and then depositing a layer of metal such as aluminum over the first dielectric layer. The metal layer is then anodized to form a porous layer and a material layer is deposited over a surface of the porous layer such that the material deposits on the surface of the porous layer without contacting the silicon surface.
申请公布号 US9373731(B2) 申请公布日期 2016.06.21
申请号 US201214128465 申请日期 2012.06.28
申请人 NEWSOUTH INNOVATIONS PTY LIMITED 发明人 Lennon Alison Joan;Li Zhongtian;Wenham Stuart Ross;Lu Pei Hsuan
分类号 H01L31/00;H01L31/0224;H01L21/225;H01L31/0216;H01L31/068;H01L31/18;H01L31/056 主分类号 H01L31/00
代理机构 代理人
主权项 1. A method of forming an electrical contact for a solar cell device, the method comprising: a) depositing polymer lines on a surface of the solar cell device; b) forming a metal layer over the polymer lines and the surface of the device; c) performing a process to lift-off portions of the metal layer formed over the polymer lines to form a plurality of isolated regions in the metal layer; and d) selectively anodizing the isolated regions of the metal layer to provide at least one insulating region and at least one metal region, whereby the at least one metal region forms the electrical contact of the solar cell device.
地址 Sydney, NSW AU