| 摘要 |
Solid aluminum nitride, deposited for example, in epitaxial layers, is prepared by reacting aluminum and selenium to form aluminum monoselenide, and transporting the aluminum monoselenide in an inert carrier gas to a heated deposition zone where it is contacted with and reacts with nitrogen to give the aluminum nitride, the carrier gas flushing away elemental selenium also produced in the deposition zone.
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