| 发明名称 |
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE |
| 摘要 |
According to one embodiment, there is provided a semiconductor device having a mark, the mark including a reference pattern extending in a first direction, a measuring pattern extending in the first direction, and a first stepped portion. The measuring pattern is separated by a predetermined distance in the second direction intersecting the first direction from the reference pattern. The first stepped portion has a level difference of one or more steps and is disposed on side in the second direction of the measuring pattern. |
| 申请公布号 |
US2016260643(A1) |
申请公布日期 |
2016.09.08 |
| 申请号 |
US201514847517 |
申请日期 |
2015.09.08 |
| 申请人 |
Kabushiki Kaisha Toshiba |
发明人 |
KOSHIBA Takeshi |
| 分类号 |
H01L21/66;H01L21/3065;H01L21/308;H01L23/544 |
主分类号 |
H01L21/66 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A semiconductor device comprising a mark, the mark including:
a reference pattern extending in a first direction; a measuring pattern extending in the first direction; a first stepped portion disposed on one side in a second direction intersecting the first direction of the measuring pattern, wherein the measuring pattern is separated by a predetermined distance in the second direction from the reference pattern, and the first stepped portion has a level difference of one or more steps. |
| 地址 |
Minato-ku JP |
