发明名称 |
Photomask for use in integrated circuits - comprising glass plate with transparent conductive layer of indium oxide and chromium layer formed on it |
摘要 |
Photo mask for use in integrated circuit comprises a glass plate with a flat surface, a transparent conductive layer (I) of indium oxide formed on the glass plate, and a chromium metal layer formed on (I). (I) has a transmissivity of >70% to light with a wavelength of 400 mu, a surface resistance of 1 k OMEGA/cm2 and a thickness of 10-500 m mu. The thickness of the chromium layer is 10-500 m mu. The mask has a long lifetime and a high mechanical strength. |
申请公布号 |
NL7803151(A) |
申请公布日期 |
1979.09.25 |
申请号 |
NL19780003151 |
申请日期 |
1978.03.23 |
申请人 |
HOYA ELECTRONICS CO., LTD. TE TOKIO. |
发明人 |
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分类号 |
G03F1/00;(IPC1-7):03F1/00 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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