发明名称 |
METHOD OF EXPOSING RADIATION SENSITIVE LAYER WITH XXRAY |
摘要 |
Radiation sensitive layers are x-ray exposed by providing a metal mask pattern on the layer through which the layer is exposed. The metal mask pattern is formed by applying a blanket metal layer to the radiation sensitive layer followed by an electron beam sensitive resist layer which is patterned by an electron beam exposure process. The exposed portions of the metal layer are then etched away to form the metal mask pattern. |
申请公布号 |
JPS54118175(A) |
申请公布日期 |
1979.09.13 |
申请号 |
JP19790015119 |
申请日期 |
1979.02.14 |
申请人 |
IBM |
发明人 |
HARARUDO BEEREN;YOHAN GURETSUSHIYUNAA;BERUNAA KURUTSUKE;PEETAA NEEMITSUTSU |
分类号 |
G03F7/095;H01L21/027 |
主分类号 |
G03F7/095 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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