| 摘要 |
PURPOSE:To secure a high-speed and high-accuracy positionding with the positioning device which is used in the reduction projection exposure device for the integrated circuit pattern, by comparing the output voltage which detected photoelectrically the position of the positioning mark on the reticle with the set voltage of a fixed amount to control the fine shifting mechanism. CONSTITUTION:Set voltage width 2 is given corresponding to the positioning accuracy of the reticle, and output voltage 3 of photoelectric microscope 1 is compared 4 then with set voltage width 2. Shifting stage 7 is moved via amplifier circuit 5 and motor driving circuit 6 so that voltage 3 may be within the range of the set voltage, and reticle 8 is vacuum-absorbed to be fixed on stage 7. The positions are detected via photoelectric microscope 1' and 1'' for positioning cross- shaped pattern 9 and 10 on reticle 8 respectively. And the positioning of the reticle in the three directions x, y and theta each is carried out through driving of fine shifting mechanism 11. |
